FIB – Focused Ion Beam

Contact

Photo of Prof. Dr. rer. nat. Thomas E. Weirich © Copyright: T. Weirich

Name

Thomas Weirich

Division Manager FIB and TEM

Phone

work
+49 241 80 24349

Email

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Focused ion beam technology

In microscopy with focused ion beams, FIB, charged and accelerated atoms, namely ions, are directed at the sample instead of electrons.

Normally, gallium Ga+ ions, atomic number 31, are used for this purpose because, in addition to generating secondary electrons, they can also remove material from the sample in a controlled and effective manner.

Areas of application

This method is therefore often used to expose certain areas below the surface for further analysis or to specifically produce electron-transparent lamellae from material areas of interest for a TEM investigation.

Application Note

NOx emission control: UNDERSTANDING PERFORMANCE REQUIRES INSIGHTS AT THE NANOMETER LEVEL

An interactive 360 degree view of the FIB is available here

  View of our Focused Ion Beam Copyright: © A. Herwartz FIB - Focused Ion Beam Strata FIB 400

Dual Beam FIB:

FIB Strata 400

FEI, now Thermo-Fischer Company

Built:

2010, installed in GFE: May 2018

Ion source:

Ga Liquid Metal Ion Source - LMIS

I - Accelerating voltage:

0.5-30 kV

Ion beam current:

1.5pA-20nA

Electron source:

FEG (field emission gun)

E - Acceleration voltage:

1-30kV

Electron beam current:

5pA -24nA

SE Image - Detectors:

TLD :Through-lens detector

CDEM : Channel Detection Electron Multiplier

ETD: Everhart-Thornley Detector

GIS, Gas Injection System:

Pt- (C9H16Pt) and C- (Carbon) containing gas

Micromanipulator:

AutoProbe 200

Omniprobe, now Oxford Company
 
View into the FIB sample chamber Copyright: © A. Herwartz

View into the FIB sample chamber

View into the FIB sample chamber Copyright: © A. Herwartz

View into the FIB sample chamber

Deposition of platinium protection layer with ion beam Copyright: © GFE

1) Deposition of a platinum protective layer with the ion beam, viewing angle 0 degrees/ stage position 52 degrees

Electron beam image taken at 52 degrees angle Copyright: © GFE

2) same as 1) electron beam image: stage position and angle of view: 52 degrees

Sputtering on both sides of the lamella Copyright: © GFE

3) Sputtering on both sides of the lamella reducing the ion beam current the closer we get to the lamella

Seen with electron beam by 52 degrees angle of view Copyright: © GFE

4) same as 3) seen with electron beam by 52 degrees

Stage at seven degrees: free cutting Copyright: © GFE

5) Stage at 7 degrees: free cutting

After cutting free, the lamella is fixed on one side only Copyright: © GFE

6) Result of free cutting: lamella is only fixed on one side

Retracting the platinium nozzle and the micromanipulator needle Copyright: © GFE

7) Stage at 0 degrees: pull in the platinium gas noozle and the micromanipulator needle

Fixing the lamella to the needle with platin Copyright: © GFE

8) Fixing the lamella to the needle with platinium at 0 degree then free cutting on the other side

Moving the micromanipulator with the lamella to a safe position. Copyright: © GFE

9) Moving the micomanipulator with the lamella to a safe „park“ position

Fixing the lamella to a TEM grid Copyright: © GFE

10) Fixing the lamella to a TEM grid with platinium

Untighten from the needle Copyright: © GFE

11) Untighten from the needle

Control image with electron beam Copyright: © GFE

12) Control image with electron beam: lamella is still too thick

The lamella is thinned from both sides Copyright: © GFE

13) The lamella is thinned from both sides

Ion beam image: finished lamella at 52 degrees Copyright: © GFE

14) Ion beam image: finished lamella at 52 degrees

Electron beam image: finished lamella Copyright: © GFE

15) Electron beam image: finished lamella at 52 degrees

 
 

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